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Porous Ceramic

Wafer Chuck

Wafer Chuck
Based on excellent flatness and uniform adsorption force, our wafer chucks deliver optimized performance across a wide range of semiconductor front-end and back-end equipment, including grinding, sawing, inspection, and cleaning. We provide essential solutions for next-generation packaging technologies, such as TSV and TGV, as well as high-precision HBM manufacturing processes that demand the utmost accuracy. Our chucks deliver outstanding performance and reliability in bonding and debonding equipment, where stable fixation and complete protection is important in wafers. We deliver optimized porous materials and customized designs for diverse operational environments, driving higher manufacturing yields and high precise process stability.
wafer chuck Back grinding chuck

01

Prevention of Material Damage

Unlike conventional aluminum hole-type chucks, our solution utilizes porous ceramics with micro-pores for adsorption, preventing any surface damage.
웨이퍼 진공척 Wafer vacuum chuck 폴리싱 연마척 Polishing chuck 베큠척 Vacuum Chuck SiC Wafer Chuck

02

High-Precision Capability

We achieve excellent product flatness by our proprietary grinding and polishing technology.(Target flatness specifications can be customized)
Wafer cleaning Porus chuck Semiconductor wafers SiC

03

Excellent Particle Resistance

Utilizing large pore ceramics, this product directly adsorbs and evacuates particles generated inside the material pores